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Photoluminescence enhancement from silicon quantum dots located in the vicinity of a monolayer of gold nanoparticles

机译:来自位于金纳米粒子的单层附近的硅量子点的光致发光增强

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摘要

In this paper we show that it is possible to carry out a functional coupling between a thin film of silicon quantum dots embedded in a silicon nitride matrix (SiQDs) and a monolayer of gold nanoparticles by using dry and low temperature techniques, such as those used in microelectronics industry, i.e., Remote Plasma Enhanced Chemical Vapor Deposition (RPECVD) and Sputtering. The coupled structure showed 105% of photoluminescence (PL) enhancement, compared with PL observed from the SiQDs without the gold monolayer. The SiQDs used as light emitters have an average diameter of 3.1 nm, a particle density of 6.04 +/- 10(12) particles per cm(2) and a maximum PL peak at 505 +/- 5 nm. Additionally, the gold nanoparticles were designed with the following characteristics: the particles are embedded in a silicon nitride matrix, show quasi-spherical shapes, an average diameter of 2.9 nm, a particle density of 2.52 x 10(12) particles per cm(2) and their surface plasmon resonance is located at 540 +/- 3 nm. We found that there is an optimum separation distance between SiQDs and the gold monolayer to achieve the maximum photoluminescence enhancement. For our structure, such optimal distance was 10 +/- 1 nm. We consider that there could be two combined physical effects responsible of the enhancement: (a) a plasmonic diffraction-limited coupling and (b) a change of the scattering mechanisms of the primary laser light.
机译:在本文中,我们表明,通过使用干燥和低温技术,可以在氮化硅基质(SiQDS)和单层金纳米粒子中嵌入含有氮化硅基质(SiQDS)的薄膜之间的功能耦合。在微电子工业中,即远程等离子体增强化学气相沉积(RPECVD)和溅射。耦合结构显示出105%的光致发光(PL)增强,与没有金单层的SIQDS观察到的PL相比。用作光发射器的SIQDS的平均直径为3.1nm,颗粒密度为每厘米(2)的6.04 +/- 10(12)颗粒,最大PL峰值为505 +/- 5nm。另外,使用以下特征设计了金纳米颗粒:颗粒嵌入氮化硅基质中,显示准球形,平均直径为2.9nm,颗粒密度为2.52×10(12)厘米颗粒(2它们的表面等离子体共振位于540 +/- 3nm。我们发现SIQDS和金单层之间存在最佳分离距离,以实现最大的光致发光增强。对于我们的结构,这种最佳距离为10 +/- 1nm。我们认为,可能存在两种组合的身体效应,负责增强:(a)等离子体衍射限制耦合和(b)主要激光散射机构的变化。

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  • 来源
    《RSC Advances》 |2015年第113期|共9页
  • 作者单位

    Univ Nacl Autonoma Mexico Inst Invest Mat Mexico City 04510 DF Mexico;

    Univ Nacl Autonoma Mexico Inst Fis Mexico City 01000 DF Mexico;

    Univ Nacl Autonoma Mexico Inst Fis Mexico City 01000 DF Mexico;

    Univ Nacl Autonoma Mexico Inst Invest Mat Mexico City 04510 DF Mexico;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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