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首页> 外文期刊>Journal of Physics. Condensed Matter >Variation of the 4x1 to 8x2 structural transition temperature of quasi-one-dimensional indium chains upon carrier doping from Si(111) substrates
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Variation of the 4x1 to 8x2 structural transition temperature of quasi-one-dimensional indium chains upon carrier doping from Si(111) substrates

机译:Si(111)衬底载荷掺杂时拟一维铟链的4x1至8x2结构转变温度的变化

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摘要

We investigated the 4 x 1 to 8 x 2 structural transition temperature of quasi-one-dimensional indium chains on the (111) surface of Si substrates possessing various carrier concentrations via low-energy electron diffraction. The transition temperature was found to decrease from 120 K to below 77 K with increasing carrier concentration on both n- and p-type Si(111) substrates. This decrease in the transition temperature was found to be proportional to the shift of the Fermi level, which was numerically evaluated using a one-dimensional charge transfer model of the interface. The obtained results demonstrate that doping of the surface state with both electrons and holes can be readily controlled by judicious selection of Si substrates with appropriate carrier type and concentration.
机译:我们研究了通过低能电子衍射具有各种载体浓度的Si基板的(111)表面上的四维铟链的4×1至8×2结构转变温度。 发现转变温度从120K降至77 k,随着N-和P型Si(111)衬底上的载流子浓度增加。 发现转变温度的这种降低与费米水平的偏移成比例,其使用界面的一维电荷转移模型进行数值评估。 所得结果表明,通过具有适当的载体类型和浓度的明智选择Si基板可以容易地控制具有电子和孔的表面状态的掺杂。

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