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Fabrication of Heterojunction Diode Based on n-ZnO Nanowires/p-Si Substrate: Temperature Dependent Transport Characteristics

机译:基于N-ZnO纳米线/ P-Si衬底的异质结二极管的制造:温度依赖性传输特性

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Herein, we report the growth and characterizations of well-crystalline n-ZnO nanowires assembled in micro flower-shaped morphologies. The nanowires are grown on p-Silicon substrate and characterized in terms of their structural, morphological and electrical properties. Temperature dependent transport characteristics of the fabricated n-ZnO/p-Si heterojunction diode were examined. The morphological studies revealed that the nanowires are grown in high-density and arrange in special micro flower shaped morphology. The structural characterizations confirmed that the nanowires are well-crystalline and possessing wurtzite hexagonal phase. The electrical properties were evaluated by examining the I-V characteristics of the fabricated n-ZnO/p-Si heterojunction diode. The I-V characteristics were studied at temperature < 300 K and >= 300 K in the forward and reverse bias conditions. The detailed temperature dependent electrical properties revealed that the fabricated heterojunction assembly shows a diode-like behavior with a turn-on voltage of 5 V at almost all temperatures and the delivered current changes between similar to 1 to similar to 5 mu A when temperature changes from 77 K to 425 K. The rectifying behavior of the fabricated heterojunction diode, at 5 V, was demonstrated by rectifying ratio of similar to 4 at 77 K which decreases to similar to 1.5 at 425 K. This analysis also showed that the mean potential barrier of the fabricated heterojunction (similar to 1.2 eV) is larger than the energy difference (0.72 eV) of the work functions between Si and ZnO.
机译:在此,我们报告了在微花形形态组装成组装的井结晶N-ZnO纳米线的生长和表征。纳米线在p硅衬底上生长,其特征在于它们的结构,形态和电性能。检查了制造的N-ZnO / P-Si异质结二极管的温度依赖性传输特性。形态学研究表明,纳米线以高密度生长,并在特殊的微花形态中排列。结构表征证实纳米线是晶体良好的并且具有紫立岩六边形相。通过检查制造的N-ZnO / P-Si异质结二极管的I-V特性来评估电性能。在前向和反向偏置条件下在温度<300 k和> = 300k中研究I-V特性。详细的温度依赖性电性能显示,制造的异质结组装显示了几乎所有温度的电压电压的二极管状行为,并且在温度变化时,输送电流变化到类似于5μA的变化。 77 k至425 k。通过在77 k下的液化比在47 k下的整流比在425k下降至类似于1.5时,证明了制造的异质结二极管的整流行为。该分析还显示平均潜在屏障在制造的异质结(类似于1.2eV)的情况大于Si和ZnO之间的工作功能的能量差(0.72eV)。

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