首页> 外文期刊>Journal of nanoscience and nanotechnology >Characterization of Subgap Density-of-States by Sub-Bandgap Optical Charge Pumping in In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors
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Characterization of Subgap Density-of-States by Sub-Bandgap Optical Charge Pumping in In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors

机译:通过IN0.53GA0.47AS金属氧化物半导体场效应晶体管中的子带隙光学电荷泵浦划桨光电荷泵的分析

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We report an experimental characterization of the interface states (D-it(E)) by using the subthreshold drain current with optical charge pumping effect in In0.53Ga0.47As metal-oxide-semiconductor field-effect transistors (MOSFETs). The interface states are derived from the difference between the dark and photo states of the current-voltage characteristics. We used a sub-bandgap photon (i.e., with the photon energy lower than the bandgap energy, E-ph < E-g) to optically excite trapped carriers over the bandgap in In0.53Ga0.47As MOSFETs. We combined a gate bias-dependent capacitance model to determine the channel length-independent oxide capacitance. Then, we estimated the channel length-independent interface states in In0.53Ga0.47As MOSFETs having different channel lengths (L-ch = 5, 10, and 25 [mu m]) for a fixed overlap length (L-ov = 5 [mu m]).
机译:我们通过在IN0.53Ga0.47as金属氧化物 - 半导体场效应晶体管(MOSFET)中,通过使用具有光学电荷泵送效果的亚阈值漏极电流来报告接口状态的实验表征(D-IT(e))。 接口状态来自电流 - 电压特性的暗和光电之间的差异。 我们使用了子带隙光子(即,光子能量低于带隙能量,E-PH

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