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首页> 外文期刊>Journal of Materials Science >Planar impacts on nanocrystalline SiC: a comparison of different potentials
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Planar impacts on nanocrystalline SiC: a comparison of different potentials

机译:平面对纳米晶体SiC的影响:不同潜力的比较

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摘要

Silicon carbide ceramics under shock loading is an important aspect in studying their physical and mechanical properties. Molecular dynamics simulations have been carried out using Tersoff-1989, Tersoff-1994, Tersoff-2005 and Vashishta potentials, respectively. The Hugoniot states including compression stress, shear stress, temperature and shock wave velocity are calculated, as well as shock-induced plasticity and the shock wave fronts. A comprehensive comparison among different potentials, as well as comparison to current available experiments, has been made. Tersoff-1989, Tersoff-1994 and Tersoff-2005 potentials are easily to overestimate the shock stress, shear stress and temperature, as well as shock wave velocity, while Vashishta potential shows excellent agreement with experimental data. The Hugoniot elastic limit is 14.5 GPa and the maximum shear stress is 6 GPa using Vashishta potential which are in good agreement with experiments, while Tersoff-like potentials yield much higher values. Due to differences in radial distribution function among these potentials, Vashishta potential is prone to produce plasticity and structural phase transformation basing on the statistics of the coordination numbers of atoms. Besides, the shock wave fronts show little difference among these potentials under elastic shock compression at low particle velocity. However, when it comes to high shock intensity resulting in plasticity or phase transition, the Tersoff-1989 and Tersoff-1994 produce the widest shock wave fronts, followed by Tersoff-2005, while Vashishta potential has the narrowest wave front. By comprehensive comparisons, the Vashishta potential is demonstrated to be the most suitable one to describe the silicon carbides ceramics under shock loadings. Our work provides useful information to select a suitable potential to study the shock response of silicon carbides ceramics using molecular dynamics simulations.
机译:抗冲击件下的碳化硅陶瓷是研究其物理和机械性能的重要方面。分别使用Tersoff-1989,Tersoff-1994,Tersoff-2005和Vashishta电位进行了分子动力学模拟。计算包括压缩压力,剪切应力,温度和冲击波速度的Hugoniot态,以及冲击诱导的可塑性和冲击波前沿。已经进行了不同潜力的全面比较,以及与当前可用实验的比较。 Tersoff-1989,Tersoff-1994和Tersoff-2005潜力很容易高估冲击应力,剪切应力和温度以及冲击波速度,而Vashishta潜力与实验数据显示出优异的一致性。 Hugoniot弹性极限是14.5 GPa,最大剪切应力使用Vashishta潜力与实验良好的vadishta潜力,纺织品的潜力均产生更高的值。由于这些潜力之间的径向分布功能的差异,Vashishta电位容易产生塑性和结构相变,基于原子的配位数量的统计数据。此外,在低粒子速度下弹性冲击压缩下这些电位的差异很小。然而,当涉及高冲击强度导致可塑性或相位过渡时,Tersoff-1989和Tersoff-1994产生最宽的冲击波前沿,然后是Tersoff-2005,而Vashishta电位具有最窄的波前。通过综合比较,VASHISHTA电位被证明是最适合的抗冲击件下描述碳化硅陶瓷的电位。我们的工作提供了使用分子动力学模拟来选择合适的信息来研究碳化硅陶瓷的冲击响应。

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  • 来源
    《Journal of Materials Science 》 |2018年第9期| 共15页
  • 作者单位

    South China Univ Technol Sch Civil Engn &

    Transportat Guangzhou 510640 Guangdong Peoples R China;

    South China Univ Technol Sch Civil Engn &

    Transportat Guangzhou 510640 Guangdong Peoples R China;

    South China Univ Technol Sch Civil Engn &

    Transportat Guangzhou 510640 Guangdong Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学 ;
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