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首页> 外文期刊>Journal of Electronic Materials >Annealing Temperature Dependence of ZTO Thin Film Properties and Its Application on Thin Film Transistors by Inkjet Printing
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Annealing Temperature Dependence of ZTO Thin Film Properties and Its Application on Thin Film Transistors by Inkjet Printing

机译:ZTO薄膜特性的退火温度依赖性及其在薄膜晶体管上喷墨印刷的应用

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In this study, inkjet-printed zinc tin oxide:Cl (ZTO:Cl) thin films were analyzed using x-ray diffraction, x-ray photoelectron spectroscopy (XPS) and all the films were annealed at temperatures ranging from 100 degrees C to 600 degrees C. XPS analysis showed that the formation of metal-oxide bonds in the films was complete with annealing temperatures at or above 500 degrees C. Furthermore, inkjet-printed thin film transistors (TFTs) were examined using scanning electron microscopy and current-voltage characteristic measurements. The ZTO:Cl TFTs performed best when annealed at 500 degrees C. The average carrier mobility and the on/off ratio were found to be 2.71 cm(2)/V s and 1.82x10(7), respectively.
机译:在该研究中,使用X射线衍射进行喷墨印刷的氧化锌氧化锌氧化锡:Cl(ZtO:Cl)薄膜,X射线光电子谱(XPS)和所有薄膜在从100摄氏度范围内的温度下退火 XPS分析表明,膜中的金属氧化物键在500℃的退火温度下完成。此外,使用扫描电子显微镜和电流电压检查喷墨印刷的薄膜晶体管(TFT) 特征测量。 ZTO:CL TFT在500摄氏度下退火时最佳。发现平均载流子迁移率和开/关比分别为2.71cm(2)/ V s和1.82×10(7)。

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