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首页> 外文期刊>Journal of Electronic Materials >Microstructural Evolution of Ni-Sn Transient Liquid Phase Sintering Bond during High-Temperature Aging
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Microstructural Evolution of Ni-Sn Transient Liquid Phase Sintering Bond during High-Temperature Aging

机译:高温老化期间Ni-Sn瞬态液相烧结粘合的微观结构演化

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摘要

For high-temperature-resistant packaging of new generation power chip, a chip packaging simulation structure of Ni/Ni-Sn/Ni was bonded by a transient liquid-phase sintering process. High-temperature aging experiments were carried out to investigate joint heat stability. The microstructural evolution and mechanism during aging, and mechanical properties after aging were analyzed. The results show that the 30Ni-70Sn bonding layer as-bonded at 340A degrees C for 240 min is mainly composed of Ni3Sn4 and residual Ni particles. When aged at 350A degrees C, because of the difficulty of nucleation for Ni3Sn and quite slow growth of Ni3Sn2, the bonding layer is stable and the strength of that doesn't change obviously with aging time. When aging temperature increased to 500A degrees C, however, the residual Ni particles were gradually dissolved and the bonding layer formed a stable structure with dominated Ni3Sn2 after 36 h. Meanwhile, due to the volume shrinkage (4.43%) from Ni3Sn2 formation, a number of voids were formed. The shear strength shows an increase, resulting from Ni3Sn2 formation, but then it decreases slightly caused by voids. After aging at 500A degrees C for 100 h, shear strength is still maintained at 29.6 MPa. In addition, the mechanism of void formation was analyzed and microstructural evolution model was also established.
机译:对于新一代电力芯片的高温耐高温封装,通过瞬态液相烧结过程粘合Ni / Ni-Sn / Ni的芯片封装仿真结构。进行高温老化实验以研究关节热稳定性。分析了老化过程中的微观结构演化和机理,以及老化后的机械性能。结果表明,在340A℃下键合240分钟的30Ni-70Sn粘合层主要由Ni3SN4和残留的Ni颗粒组成。当在350A℃下老化时,由于Ni3Sn的核心难以核心并且Ni3Sn2的相当缓慢,粘合层是稳定的,并且随着老化时间而言不会显着改变。然而,当老化温度升至500A的C时,残留的Ni颗粒逐渐溶解,并且粘合层在36小时后形成稳定的Ni3SN2。同时,由于来自Ni3SN2的体积收缩(4.43%),形成了许多空隙。剪切强度显示出增加,由Ni3SN2形成产生,但是它由空隙略微降低。在500A℃下老化100小时后,剪切强度仍保持在29.6MPa。此外,分析了空隙形成的机制,并建立了微观结构演化模型。

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