首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Fabrication of plasmonic gold-nanoparticle-transition metal oxides thin films for optoelectronic applications
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Fabrication of plasmonic gold-nanoparticle-transition metal oxides thin films for optoelectronic applications

机译:质粒镀金 - 纳米粒子过渡金属氧化物薄膜的制作光电应用

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摘要

A simple, cost-effective, and one-step procedure for fabrication of gold-nanoparticle-transition metal oxide (Au-TMO) thin films with tuned optical and structural properties is described. In this approach, a homogeneous mixed precursor solution was used to fabricate Au-MoO3 and Au-WO3 thin films via a spray pyrolysis technique. The in-situ grown Au nanoparticles in the host matrices exhibited a characteristic surface plasmon resonance absorption in the visible-NIR region with peak positions at lambda(max )approximate to 600 nm, approximate to 550 nm, and approximate to 575 nm for Au-MoO3, Au-alpha-WO3 (amorphous), and Au-h-WO3 (hexagonal) films, respectively. The structural and morphological characterization measurements confirmed that the high purity in-situ grown Au nanoparticles were 10-100 nm in size, and individual particles were embedded into the host matrices. These films were applied as plasmon-induced photoelectric conversion devices with ITO/NiOx/Au-WO3/Ag structures as a prototype device. The device exhibited a short-circuit current of 0.1 mA with an open-circuit voltage of similar to 1.4 V under one-sun illumination. Our one-step fabrication approach is highly promising for fabricating other Au-TMOs thin films with tuned optical properties on a large area and can be applied for various optoelectronic applications. (C) 2018 Elsevier B.V. All rights reserved.
机译:描述了一种简单,成本效益和用于制备具有调谐光学和结构特性的金纳米颗粒过渡金属氧化物(AU-TMO)薄膜的一步步骤。在这种方法中,使用均匀的混合前体溶液通过喷雾热解技术制造Au-Moo3和Au-WO3薄膜。宿主基质中的原位生长Au纳米颗粒在λ(最大)的峰值位置近似为600nm,近似为550nm,近似为575nm,并且近似为575nm的峰值位置,并且对于au-的近似MOO3,Au-alpha-WO3(非晶)和Au-H-WO3(六边形)薄膜。结构和形态学表征测量证实,高纯度的原位生长Au纳米颗粒的尺寸为10-100nm,并且将个体颗粒嵌入宿主基质中。这些薄膜用ITO / NiOx / Au-WO3 / Ag结构作为原型装置作为等离子体诱导的光电转换装置。该器件表现出0.1 mA的短路电流,开路电压在一阳光照射下类似于1.4 V的开路电压。我们的一步制造方法非常有希望在大面积上用调谐光学性能制造其他AU-TMOS薄膜,并且可以应用于各种光电应用。 (c)2018年elestvier b.v.保留所有权利。

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