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首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Mesoporous ZnO thin films obtained from molecular layer deposited 'zincones'
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Mesoporous ZnO thin films obtained from molecular layer deposited 'zincones'

机译:从分子层沉积“锌酮”的中孔ZnO薄膜

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The delivery of porous ZnO thin films represents a challenge due to the low porosity achievable by conventional thin film deposition methods. In this contribution, the synthesis of mesoporous ZnO thin films is demonstrated through calcination in air of hybrid Zn-based polymers (zincone) obtained by molecular layer deposition (MLD). The calcination process was followed as a function of temperature using X-ray reflectivity and diffraction, together with spectroscopic ellipsometry. Temperature ranges were identified for the removal of the organic ligands (120 degrees C) and ZnO crystallization (340 degrees C). The total porosity and open porosity were also determined by ellipsometric porosimetry (EP) and grazing incidence small-angle X-ray scattering (GISAXS). The calcination temperature was identified as a control parameter for obtaining different (open) porosity contents and pore size distributions (PSDs). Open porosity values of 12.6% and 19.6% were obtained by calcining the zincones up to 600 degrees C and 400 degrees C, respectively. Open PSDs with a mean value of 3.2 nm (400 degrees C) and 4.6 nm (600 degrees C) were obtained. The formation of larger slit-shaped pores was demonstrated at higher temperatures, due to the growth and coalescence of ZnO crystallites.
机译:多孔ZnO薄膜的递送代表了由于常规薄膜沉积方法可实现的低孔隙率,这是一种挑战。在该贡献中,通过在通过分子层沉积(MLD)获得的杂化Zn的聚合物(锌酮)的空气中煅烧来证明中孔ZnO薄膜的合成。用X射线反射率和衍射以及光谱椭圆形测量,遵循煅烧过程作为温度的函数。确定温度范围用于除去有机配体(120℃)和ZnO结晶(340℃)。总孔隙率和开放孔隙率也通过椭圆形孔隙瘤(EP)和放牧发生小角X射线散射(吉即)测定。将煅烧温度鉴定为用于获得不同(Open)孔隙率和孔径分布(PSD)的对照参数。通过分别煅烧高达600℃和400℃的锆石,获得12.6%和19.6%的开放孔隙率值。获得平均值为3.2nm(400℃)和4.6nm(600℃)的平均值的PSD。由于ZnO微晶的生长和聚结,在较高温度下表明了较大的狭缝形孔的形成。

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