A'/> Composition and dynamics of high power impulse magnetron discharge at W-Mo-C target in argon atmosphere
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Composition and dynamics of high power impulse magnetron discharge at W-Mo-C target in argon atmosphere

机译:在氩气氛中W-MO-C靶标的高功率脉冲磁控磁控磁阻会的组成和动力学

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Abstract Metal-doped diamond-like carbon (Me-DLC) is a typical industrial solution for wear resistant coating due to their tribological properties. DLC doping with metal is used to reduce internal stress of the DLC coating, improve its thermal stability, hardness, coating-substrate adhesion, and wear resistance. Furthermore, application of the High Power Impulse Magnetron Sputtering (HiPIMS) for Me-DLC deposition allows improvement of coating adhesion and densification of the coating. To improve the properties of the DLC coatings doping with tungsten and molybdenum from a mixed W-Mo-C target can be used. This study concerns the plasma chemistry and composition for a W-Mo-C target operated with HIPIMS in argon atmosphere. For a HIPIMS discharge with a fixed pulse length of 150μs a linear dependence of the average power and current are observed. The optical emission spectroscopy experiments reveal a temporal dependence of the plasma composition as the current pulse develops. First plasma is dominated by argon neutrals and ions followed by molybdenum and tungsten. Significant separation between the two metal species is observed in terms of the times of onset and peak of the emission. As a consequence of the change of the neutral gas to metal ratio the estimated effective electron temperature, T e , changes from ~2eV as estimated from Ar I emission to ~0.3–0.6eV as indicated by W I emission. A change of T e is also observed with the change of HIPIMS frequency: the T e estimated from metal excitations increases most probably as a result of the processes taking place in the afterglow phase between HIPIMS pulses. The transition from argon plasma at the beginning of the pulse to metal-rich plasma in the second phase of the pulse is discussed in comparison with the ion current measurements performed with a planar probe. Highlights ? Optical emission spectroscopy study of a multicomponent target (Mo-W-C) in argon atmosphere ? Time-resolved OES measurements demonstrated a temporal separation of Ar, W and Mo emission ? Temporal dependence of the saturation ion current was proposed to be a result of Ar, Mo and W dynamics in the discharge ?
机译:<![cdata [ 抽象 金属掺杂的金刚石状碳(ME-DLC)是一种典型的耐磨涂层的工业解决方案他们的摩擦学特性。 DLC用金属掺杂用于降低DLC涂层的内应力,改善其热稳定性,硬度,涂层基板粘附和耐磨性。此外,对ME-DLC沉积的高功率脉冲磁控溅射(HIPIMS)的应用允许改善涂层的涂层粘附和致密化。为了改善掺杂与钨和来自混合的W-MO-C靶标的钨和钼的DLC涂层的性质。该研究涉及用氩气氛中的Hipims操作的W-Mo-C靶的血浆化学和组合物。对于具有150的固定脉冲长度的Hipims放电,观察到平均功率和电流的线性依赖性。当电流脉冲发生时,光发射光谱实验显示了等离子体组合物的时间依赖性。第一个等离子体由氩中的中性和离子主导,然后是钼和钨。在发射的发作时间和发射峰之间观察到两种金属物种之间的显着分离。由于中性气体的变化与金属比例的估计有效的电子温度, t e ,从〜 2 EV,从AR I发射到〜 0.3-0.6 EV,如WI发射所示。更改 t e 随着变化也观察到Hipims频率: t e 从金属激发估计大多数增加可能是由于在HIPIMS脉冲之间的余辉阶段进行的过程。与用平面探针执行的离子电流测量相比,从脉冲开始到脉冲的第二阶段中的富含金属等离子体的氩气等离子体的转变。 突出显示 在氩气氛中的多组分目标(MO-WC)的光发射光谱研究< / ce:para> 时间分辨的OES测量显示AR,W和MO发射的时间分离 饱和离子电流的时间依赖性被提出为AR,MO的结果和在放电中的动态

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