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Magnetic Field Effect on Pre-Sheath Dynamics in a High Power Impulse Magnetron Sputtering (HiPIMS) Discharge

机译:磁场对大功率脉冲磁控溅射(HiPIMS)放电中鞘前动力学的影响

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The magnetic field effect on the pre-sheath dynamics in the high power impulse magnetron sputtering (HiPIMS) discharge has been studied. The measurements were carried out by a time resolved emissive probe in the saturated floating potential method, above the racetrack and parallel to the discharge centreline. It was observed that the potential drop and the width of potential drop across the bulk plasma increased with the magnetic field strength. An interesting feature observed was that the potential drop across the bulk plasma evolved in two phases, in the beginning of the discharge pulse (V_d) then again around 50 μs after the initiation of the discharge pulse (V_d).
机译:研究了大功率脉冲磁控溅射(HiPIMS)放电中磁场对鞘前动力学的影响。通过赛道上方且平行于排放中心线的饱和浮动电势方法中的时间分辨发射探针进行测量。观察到,在整个等离子体上的电势下降和电势下降的宽度随着磁场强度的增加而增加。观察到的一个有趣的特征是,整个体等离子体上的电势降分两个阶段发展,在放电脉冲(V_d)的开始阶段,然后在放电脉冲(V_d)的启动后约50μs内再次出现。

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