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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Structural Evolution of Flower Defects and Effects on the Electronic Structures of Epitaxial Graphene
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Structural Evolution of Flower Defects and Effects on the Electronic Structures of Epitaxial Graphene

机译:花卉缺陷的结构演变和对外延石墨烯电子结构的影响

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摘要

The structural evolution processes of flower defects in epitaxial graphene at high temperature annealing are investigated by using scanning tunneling microscopy, Raman spectroscopy, and the density functional theory calculations. The experimental results reveal that flower defects can increase in amount with the increasing of annealing time until they nucleate and evolve into complex defect structures. As the direct evidence of the structural development for flower defects evolving into the complex structures, the conjoined-twin defect is detected in epitaxial graphene with two of 2/3 flower defects joined together. The theoretical calculations show that the conjoined-twin defect has a calculated energy 2.7 eV smaller than that of two isolated flower defects. And the conjoined-twin defect as a new topological defect in graphene can bring about a bandgap of 50 meV. The calculation results also demonstrate that new van Hove singularity states will be generated in the vicinity of + (0.4-0.7) and -0.4 eV in the density of states for the dislocated carbon rings of the conjoined-twin defects. These results can provide valuable insights into the growth evolution of topological defects and their effects on the electronic structures of graphene.
机译:通过使用扫描隧穿显微镜,拉曼光谱和密度泛函理论计算,研究了高温退火处外延石墨烯的花卉缺陷结构进化过程。实验结果表明,随着退火时间的增加,花缺陷可以增加,直到它们成核并发展成复杂的缺陷结构。随着对复杂结构的花缺陷的结构发展的直接证据,在外延石墨烯中检测到连续两种缺陷,其中两个2/3花缺陷在一起。理论计算表明,连续双缺陷的计算能量2.7eV小于两种分离的花缺陷。作为石墨烯的新拓扑缺陷的联合双胞胎缺陷可以带来50 mev的带隙。计算结果还表明,新的van Hove奇异性状态将在+(0.4-0.7)和-0.4eV附近产生,以密度为连续双缺陷的脱臼碳环的状态。这些结果可以为拓扑缺陷的增长演变提供有价值的见解及其对石墨烯电子结构的影响。

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