...
首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Cisplatin as a Potential Platinum Focused Electron Beam Induced Deposition Precursor: NH3 Ligands Enhance the Electron-Induced Removal of Chlorine
【24h】

Cisplatin as a Potential Platinum Focused Electron Beam Induced Deposition Precursor: NH3 Ligands Enhance the Electron-Induced Removal of Chlorine

机译:顺铂作为潜在的铂聚焦电子束诱导沉积前体:NH 3配体增强电子诱导的氯去除

获取原文
获取原文并翻译 | 示例

摘要

Nanostructures fabricated by focused electron beam induced deposition (FEBID) often have low deposit purities that can be traced back to incomplete precursor decomposition. Among others, removal of halide ligands is particularly slow under electron irradiation. Herein, we report on the electron-induced decomposition of cisplatin (cis-Pt(NH3)(2)Cl-2), a potential precursor for Pt deposition. Cisplatin samples were irradiated with electrons, and the resulting compositional and chemical changes were monitored by surface analysis tools. The results reveal that electron exposure yields nearly pure Pt deposits, and the ligands are transformed into the gas-phase species N-2, NH3, and HCl. Also, surface-bound NHx (x < 3) species were identified that can act as reducing agents. Production of such reactive intermediates and N-2 implies that the electron-induced decomposition of the NH3 ligands releases atomic hydrogen, a species known to efficiently remove surface Cl via HCl formation. Furthermore, proton transfer from NH3 to Cl- triggered by ionization is deduced from the formation of NH4+ and proposed as a second reaction pathway producing HCl. Overall, this leads to rapid loss of the Cl ligands. We thus provide evidence that NH3 is favorable either as a ligand in FEBID precursors or as a postdeposition purification agent for halide-contaminated FEBID deposits.
机译:通过聚焦电子束引起的沉积(Febid)制造的纳米结构通常具有低沉积物纯度,其可以追溯到不完全的前体分解。其中,除去卤化物配体在电子照射下特别慢。在此,我们报告了顺铂的电子诱导的分解(CIS-Pt(NH 3)(2)Cl-2),Pt沉积的潜在前体。用电子照射顺铂样品,通过表面分析工具监测所得的组成和化学变化。结果表明,电子暴露产生几乎纯PT沉积物,将配体转化到气相物质N-2,NH 3和HCl中。此外,鉴定了表面结合的NHX(X 3)物种,其可以充当还原剂。这种反应性中间体和N-2的产生意味着NH 3配体的电子诱导的分解释放原子氢,已知通过HCl形成有效地除去表面C1的物种。此外,从NH 3从NH 3的NH 3转移到通过电离的质子转移从NH 4 +的形成中推导出并提出作为产生HCl的第二反应途径。总的来说,这导致CL配体的快速丧失。因此,我们提供了证据,即NH 3是有利的,作为Febid前体的配体或作为卤化物污染的Febid沉积物的后沉积净化剂。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号