Abstract Fabrication and electrical characterizations of graphene nanocomposite thin film based heterojunction diode
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Fabrication and electrical characterizations of graphene nanocomposite thin film based heterojunction diode

机译:石墨烯纳米复合薄膜的制造和电学特性的异质结二极管

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Abstract The use of graphene in electronic devices is becoming attractive due to its inherent scalability and is thus well suited for flexible electronic devices. Here we present the electrical characterization of heterojunction diode, based on the nanocomposite of graphene (G) with silver nanoparticles (Ag NPs), at room temperature. The diode was fabricated by depositing nanocomposite on the n-Si substrate. The current – voltage (IV) characteristic of the fabricated junction shows rectifying behavior similar to a Schottky junction. The junction parameters such as ideality factor (n), series resistance (R s ), and barrier height (? b ) has been extracted, using various methods, from the experimentally obtained IV data. The measured values of n, R s and ? b are 3.86, 45Ω and 0.367eV, respectively, as calculated from the IV curve. The numerical values of these parameters calculated by different methods are in good agreement with each
机译:<![cdata [ 抽象 由于其固有的可扩展性,Graphene在电子设备中的使用变得具有吸引力,因此非常适合灵活的电子设备。在这里,我们在室温下基于石墨烯(G)的纳米复合物,在室温下呈现异质结二极管的电学特性。通过在N-Si衬底上沉积纳米复合材料来制造二极管。电流 - 电压( i - v )的制造结的特性显示出类似于肖特基交界处的整流行为。诸如理想因素( n ),串联电阻( r s )和障碍高度( b < / CE:斜体> )已经用各种方法提取,从实验获得的 i - v 数据。 n r s b 为3.86 ,45 ω和0.367 ep ,如 i - v 曲线。通过不同方法计算的这些参数的数值与每个方法吻合良好

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