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Modulating the magnetic properties of MoS2 monolayers by group VIII doping and vacancy engineering

机译:通过VIII型掺杂和空缺工程调节MOS2单层的磁性性能

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摘要

In this work, density functional theory is adopted to study the electronic and magnetic properties of MoS2 monolayers combined with a single S vacancy defect and a group VIII (G8) atom dopant, in which the dopant is incorporated via Mo substitution. The calculated results show that the magnetic properties of monolayer MoS2 can be tuned by changing the distribution of the G8 atom and S vacancy. The S vacancy tends to decrease the net magnetic moment of the doped system when these two defects are in their closest configuration. By adjusting the distance between the dopant and the S vacancy, the doped MoS2 monolayer may show a variable net magnetic moment. In particular, all of the Ni-doped MoS2 monolayers show zero magnetic moment with or without an S vacancy. The mean-field approximation is used to estimate the Curie temperature (T-C). Our results show that Fe, Co, Ru, Rh, Os and Ir-doped MoS2 monolayers are potential candidates for ferromagnetism above room temperature. The density of states calculations provide further explanations as to the magnetic behavior of these doped systems. These results provide a new route for the potential application of atomically thin dilute magnetic semiconductors in spintronic devices by employing monolayer MoS2.
机译:在这项工作中,采用密度函数理论研究MOS2单层的电子和磁性,结合单个空位缺陷和viII(G8)原子掺杂剂,其中掺杂剂通过Mo取代掺入。计算结果表明,可以通过改变G8原子的分布和S空的分布来调谐单层MOS2的磁性。当这两个缺陷处于其最近的配置时,S空位往往会降低掺杂系统的净磁矩。通过调节掺杂剂与S空位之间的距离,掺杂的MOS2单层可以显示可变净磁矩。特别地,所有Ni掺杂的MOS2单层都显示出零磁矩,有或没有空位。平均场近似用于估计居里温度(T-C)。我们的研究结果表明,Fe,Co,Ru,Rh,OS和IR掺杂MOS2单层是潜在的铁磁性候选者以上室温。状态计算的密度提供了对这些掺杂系统的磁性的进一步解释。这些结果通过采用单层MOS2提供了一种用于通过使用单层MOS2来施加原子上稀磁半导体的新途径。

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  • 来源
    《RSC Advances》 |2018年第34期|共14页
  • 作者单位

    Northwest Univ Xian Inst Modern Phys Shaanxi Key Lab Theoret Phys Frontiers Xian 710069 Shaanxi Peoples R China;

    Northwest Univ Xian Inst Modern Phys Shaanxi Key Lab Theoret Phys Frontiers Xian 710069 Shaanxi Peoples R China;

    Northwest Univ Xian Inst Modern Phys Shaanxi Key Lab Theoret Phys Frontiers Xian 710069 Shaanxi Peoples R China;

    Northwest Univ Xian Inst Modern Phys Shaanxi Key Lab Theoret Phys Frontiers Xian 710069 Shaanxi Peoples R China;

    Northwest Univ Xian Inst Modern Phys Shaanxi Key Lab Theoret Phys Frontiers Xian 710069 Shaanxi Peoples R China;

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  • 正文语种 eng
  • 中图分类 化学;
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