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Study of nanometer-scale structures and electrostatic properties of InAs quantum dots decorating GaAs/AlAs core/shell nanowires

机译:纳米量子点纳米尺度结构和静电性能的研究装饰GaAs / Alas芯/壳纳米线

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摘要

The configurations of core/shell nanowires (NWs) and quantum dots (QDs) decorating NWs have found great applications in forming optoelectronic devices thanks to their superior performances. The combination of the two configurations would expect to bring more benefits, however, the nanometer-scale electrostatic properties of the QD/buffer layer/NW heterostructures are still unrevealed. In this study, the InAs QDs decorating GaAs/AlAs core/shell NWs are systemically studied both experimentally and theoretically. The layered atomic structures, chemical information, and anisotropic strain conditions are characterized by comprehensive transmission electron microscopy (TEM) techniques. Quantitative electron holography analyses show a large number of electrons accumulating in the InAs QD, especially at the dot apex, and charges of reversed signs and similar densities are observed to distribute at the sequential interfaces, leaving great amounts of holes in the NW core. Theoretical calculations including simulated heterostructural band structures, interfacial charge transfer, and chemical bonding analysis are in good accordance with the experimental results, and prove the important role of the AlAs buffer layer in adjusting the heterostructural band structure as well as forming stable InAs QDs on the NW surfaces. These results could be significant for achieving related optoelectronic devices with better stability and higher efficiency.
机译:装饰NWS的核心/壳纳米线(NWS)和量子点(QDS)的配置在形成光电器件方面发现了良好的应用,因为它们的性能优异。两种配置的组合将期望带来更多的益处,然而,QD /缓冲层/ NW异质结构的纳米级静电性能仍然缺陷。在这项研究中,在实验和理论上系统地研究了装饰GaAs / Alas核心/壳NW的INAS QDS。层状原子结构,化学信息和各向异性应变条件是通过综合透射电子显微镜(TEM)技术的特征。定量电子全息术分析显示了在INAS QD中积累的大量电子,特别是在点顶点处,并且观察到颠倒的迹象和类似密度的电荷以在顺序接口处分布,留下NW芯中的大量孔。包括模拟异质结构带结构,界面电荷转移和化学键合分析的理论计算均良好地根据实验结果,并证明了ALAS缓冲层在调节异质结构带结构方面的重要作用以及在稳定的INAS QDS上形成稳定的INAS QD nw表面。这些结果对于实现具有更好稳定性和更高效率的相关光电器件可能具有重要意义。

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