首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Oxygen partial pressure dependent electrical conductivity type conversion of phosphorus-doped ZnO thin films
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Oxygen partial pressure dependent electrical conductivity type conversion of phosphorus-doped ZnO thin films

机译:掺氧ZnO薄膜的氧分压依赖性电导率类型转换

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摘要

In this study, the oxygen partial pressure dependent physical properties of phosphorous-doped ZnO thin films were investigated. All thin films, grown on Al_2O_3(0 0 0 1) substrates using pulsed laser deposition, exhibited (0 0 2) orientation regardless of the oxygen partial pressure. However, as the oxygen partial pressure increased, the degree of crystallinity and the concentration of oxygen vacancies in the films decreased. All the thin-film samples showed n-type characteristics except for a sample grown at 100mTorr, which exhibited p-type characteristics. The optical band gap energy also changed with the oxygen partial pressure. The feasible microscopic mechanism of conductivity conversion is explained in terms of the lattice constant, crystallinity, and the relative roles of the substituted phosphorous in the Zn-site and/or oxygen vacancies depending on the oxygen partial pressure.
机译:在这项研究中,研究了氧分压对磷掺杂的ZnO薄膜的物理性质的影响。不管氧分压如何,使用脉冲激光沉积在Al_2O_3(0 0 0 1)衬底上生长的所有薄膜均显示(0 0 2)取向。但是,随着氧分压的增加,膜中的结晶度和氧空位浓度降低。除了在100mTorr下生长的具有p型特性的样品以外,所有薄膜样品均显示n型特性。光学带隙能量也随着氧分压而变化。根据晶格常数,结晶度以及取决于氧分压的锌位和/或氧空位中的取代磷的相对作用,解释了电导率转换的可行微观机制。

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