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Low band gap conformal polyselenophene thin films by oxidative chemical vapor deposition

机译:氧化化学汽相淀积的低带隙共形聚硒苯薄膜

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摘要

Low band gap conjugated polymers are attractive for their applications in many devices including field-effect transistors, light-emitting diodes, electrochromic devices and photovoltaics. Selenophene-based polymers have many advantageous properties over polythiophene. However, poor solubility of solution-synthesized polyselenophene restricts its applications in the form of thin films. Electrochemical deposition of polyselenophene thin films is possible, but this process is limited to conductive substrates only. In this work, for the first time, we report deposition of polyselenophene (pSe) thin films on non-conductive substrates by a vapor based method, known as oxidative chemical vapor deposition (oCVD). oCVD synthesized pSe thin films were characterized by FT-IR, UV-Vis and X-ray photoelectron spectroscopies. Moreover, the oCVD made pSe shows 0.14 eV lower band gap than its calculated values. Vapor phase deposition of pSe by oCVD provides conformal thin films in a single and dry step. The conformal and dry nature of the pSe film deposition by oCVD may be employed for fabrication of devices on paper based substrates.
机译:低带隙共轭聚合物对其在许多器件中的应用具有吸引力,这些器件包括场效应晶体管,发光二极管,电致变色器件和光伏器件。硒基聚合物比聚噻吩具有许多优势。但是,溶液合成的聚硒吩的差的溶解性限制了其以薄膜形式的应用。聚硒醚薄膜的电化学沉积是可能的,但是此过程仅限于导电基板。在这项工作中,我们首次报道了通过基于气相的方法(称为氧化化学气相沉积(oCVD))在非导电基板上沉积聚硒烯(pSe)薄膜。 oCVD合成的pSe薄膜通过FT-IR,UV-Vis和X射线光电子能谱进行表征。而且,由oCVD制成的pSe显示出比其计算值低0.14eV的带隙。通过oCVD气相沉积pSe可在单个干燥步骤中提供共形薄膜。通过oCVD沉积的pSe膜的保形和干燥性质可以用于在纸基衬底上制造器件。

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