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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >All ITO-based transparent resistive switching random access memory using oxygen doping method
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All ITO-based transparent resistive switching random access memory using oxygen doping method

机译:使用氧掺杂方法的所有基于ITO的透明电阻开关随机存取存储器

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摘要

Recently, transparent memory would be useful in invisible electronics. In this work, for the first time we present a feasibility of stable unipolar resistive switching (RS) characteristics with reset current of submicron ampere for the fully transparent ITO/oxygen-doped ITO/ITO memory capacitors, i.e., all ITO structures, produced by sputtering method, which shows a high optical transmittance of approximately 80% in the visible region as well as near ultra-violet region. In addition, in a RS test to evaluate a reliability for the proposed memory devices, we observed a stable endurance of > 100 cycles and a retention time of > 10(4) s at 85 degrees C, with a current ratio of similar to 10(2) to similar to 10(3). This result indicates that this transparent memory by engineering the amount of oxygen ions within the ITO films could be a milestone for future see-through electronic devices. (C) 2015 Elsevier B.V. All rights reserved.
机译:近来,透明存储器将在隐形电子中有用。在这项工作中,我们首次展示了对于完全透明的ITO /掺杂氧的ITO / ITO存储器电容器(即所有ITO结构)通过亚微米安培的复位电流实现稳定的单极电阻开关(RS)特性的可行性。溅射法,其在可见光区域以及在紫外线区域附近显示出大约80%的高透光率。此外,在评估所提出的存储设备的可靠性的RS测试中,我们在85摄氏度下观察到稳定的耐久度> 100个周期,保持时间> 10(4)s,电流比约为10 (2)类似于10(3)。该结果表明,通过设计ITO膜中氧离子的量来实现这种透明存储可能是未来透明电子设备的里程碑。 (C)2015 Elsevier B.V.保留所有权利。

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