Martensitic phase transformation of TiNi thin films fabricated by co-sputtering deposition

摘要

TiNi thin films deposited using co-sputtering method are evaluated. Advanced multi-target sputtering system was used to deposit the TiNi thin films. The films were heat-treated at 700 °C for 1, 10 and 100 h by sandwich thin film with a Ti plate and the transformation temperature was measured. The transformation temperature and microstructure indicate that 10 h annealing at 700 °C will be the ideal condition for Ti-50.6Ni thin films.