THIN FILM DEPOSITION DEVICE AND METHOD TO MANUFACTURE MULTI-COMPONENT THIN FILM USING CO-SPUTTERING

摘要

A thin film deposition device comprises: a shutter unit physically blocking sputtering of at least one sputtering source to form a multi-component thin film using co-sputtering; a control unit controlling an opening operation or a closing operation of the shutter unit; a timer unit setting an opening operation or a closing operation time of the shutter unit in accordance with the control of the control unit; and an actuator operating the shutter unit to be opened or closed. As such, a tiny amount of an element added to a thin film is able to be very minutely controlled; and moreover, is able to evenly be distributed on the entire thin film.;COPYRIGHT KIPO 2016