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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >The effects of the post-annealing temperature on the growth mechanism of Bi_2Sr_2Ca_1Cu_2O_(8+?) thin films produced on MgO (100) single crystal substrates by pulsed laser deposition (PLD)
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The effects of the post-annealing temperature on the growth mechanism of Bi_2Sr_2Ca_1Cu_2O_(8+?) thin films produced on MgO (100) single crystal substrates by pulsed laser deposition (PLD)

机译:后退火温度对通过脉冲激光沉积(PLD)在MgO(100)单晶衬底上产生的Bi_2Sr_2Ca_1Cu_2O_(8+?)薄膜的生长机制的影响

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The effects of post-annealing temperature were investigated on Bi_2Sr_2Ca_1Cu_2O_(8+?) thin films deposited on MgO (100) substrates by pulsed laser deposition (PLD). The structural and superconducting properties of the films have been determined by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), temperature dependent resistivity (R-T), and DC magnetization measurements. The films which were deposited at 600 °C were post-annealed in an atmosphere of a gas mixture of Ar (93%) and O_2 (7%), at temperature ranging between 800 and 880 °C. This resulted in films which exhibited a single phase of 2212 with a high crystallinity (FWHM ≈ 0.16°) and texturing along the c-axis, perpendicular to the plane of the substrate. An optimum temperature of 860 °C was found for the post-annealing thermal treatment. The critical temperature, T_c, of the films was measured as 82 K and the critical current density, J_c, was calculated as 3 x 107 A/cm2 for the film annealed at 860 °C.
机译:研究了后退火温度对通过脉冲激光沉积(PLD)沉积在MgO(100)衬底上的Bi_2Sr_2Ca_1Cu_2O_(8+?)薄膜的影响。薄膜的结构和超导性能已经通过X射线衍射(XRD),扫描电子显微镜(SEM),温度依赖性电阻率(R-T)和直流磁化强度测量来确定。在Ar(93%)和O_2(7%)的气体混合物的气氛中,在800至880°C的温度下,对在600°C下沉积的膜进行后退火。这导致膜表现出具有高结晶度(FWHM≈0.16°)的单相2212并沿c轴垂直于基材平面的方向变形。发现退火后热处理的最佳温度为860°C。对于在860℃退火的膜,膜的临界温度T_c被测量为82K,并且临界电流密度J_c被计算为3×107A / cm 2。

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