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Preparations and characterizations of polycrystalline PbSe thin films by a thermal reduction method

机译:热还原法制备多晶PbSe薄膜及其表征

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Polycrystalline PbSe thin films were deposited on Si substrates by a thermal reduction method with the carbon as the reducing agent. The X-ray diffraction (XRD) spectra show that the deposited thin films predominately crystallize with the rock-salt structures above the evaporation temperature of 600 °C, and the PbSe thin film has the optimal crystal quality at 900 °C The scanning electron microscopy (SEM) measurements reveal that the PbSe thin film with carbon addition has uniform crystal grain sizes and dense microstructure, while the thin film without carbon consists of loosely distributed and widely size-ranged crystal grains. The optical transmittance spectrum shows that the direct band gap of the PbSe film is about 0.256 e V. By the introduction of element S, PbSe_(1-x)S_x (0 <= x <= 1.0) thin films could be prepared, but excess amount of S additions (>20at.%) would cause phase segregations between PbSe and PbS phases. The deposition method presented in this paper may be useful for mass-producing polycrystalline lead chalcogenide thin films in the future.
机译:用碳作为还原剂,通过热还原法在Si衬底上沉积多晶PbSe薄膜。 X射线衍射(XRD)光谱表明,在600°C的蒸发温度以上时,沉积的薄膜主要以岩盐结构结晶,而PbSe薄膜在900°C时具有最佳的晶体质量。扫描电子显微镜(SEM)测量显示,添加碳的PbSe薄膜具有均匀的晶粒尺寸和致密的微观结构,而不含碳的薄膜则由分布较松散且尺寸范围较宽的晶粒组成。光学透射光谱表明,PbSe薄膜的直接带隙约为0.256 eV。通过引入元素S,可以制备PbSe_(1-x)S_x(0 <= x <= 1.0)薄膜,但是过量的S添加量(> 20at。%)会导致PbSe和PbS相之间的相偏析。本文提出的沉积方法可能会在将来批量生产多晶硫属元素铅薄膜中使用。

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