...
首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Experimental and First-Principles Theoretical Study of Structural and Electronic Properties in Tantalum-Doped In2O3 Semiconductor: Finding a Definitive Hyperfine Interaction Assignment
【24h】

Experimental and First-Principles Theoretical Study of Structural and Electronic Properties in Tantalum-Doped In2O3 Semiconductor: Finding a Definitive Hyperfine Interaction Assignment

机译:掺杂钽的In2O3半导体的结构和电子性质的实验和第一性原理研究:寻找确定的超精细相互作用分配

获取原文
获取原文并翻译 | 示例
           

摘要

In this work we present an experimental and theoretical study from first principles of the structural, electronic, and hyperfine properties of Ta-doped In2O3 semiconductor. The ab initio electronic structure calculations in the Ta-diluted In2O3 system enabled to obtain the structural lattice distortions and the hyperfine parameters when the Ta atom is placed at each cationic site of the bixbyite crystal structure. To this purpose we used the full-potential augmented plane wave plus local orbital (FP-APW+lo) method, within the density functional theory. The obtained results indicate that the substitutional Ta probe-impurity produces strong changes on the local structure. In addition, we performed accurate time-differential perturbed gamma-gamma angular correlations (TDPAC) key experiments in Hf-181(-> Ta-181)-implanted In2O3 samples with high crystallinity, in order to obtain high quality measurements of the electric-field gradient tensor (EFG) that unraveled the controversy settled in the literature and overcome dissimilar interpretations of previously reported TDPAC experiments. The experiments were performed at room temperature in air, after each step of a series of thermal annealing treatments in air at increasing temperatures in order to remove radiation damage and locate the Hf-181 probes at substitutional cationic sites. We succeeded to obtained two well-defined hyperfine interactions that were assigned to Ta-181 probes located at the two defect-free inequivalent cationic sites of the In2O3 crystal structure. The EFG calculations are in excellent agreement with the results of these TDPAC measurements, and show that the largest component of the diagonalized EFG, V-33, at the Ta site has mainly p character. The accuracy of the experiments together with the reliable and precise ab initio results allowed a definitive determination of the EFG at both cationic sites in this system. Formation energy calculations of defects were needed to determine the charge state of the Ta-181 impurity, which agrees with a semiconducting character for the In2O3:Ta doped system.
机译:在这项工作中,我们从Ta掺杂的In2O3半导体的结构,电子和超精细特性的第一原理进行了实验和理论研究。 Ta稀释的In2O3系统中的从头算电子结构计算使得当Ta原子位于方铁矿晶体结构的每个阳离子部位时,可以获得结构晶格畸变和超精细参数。为此,我们在密度泛函理论范围内使用了全势增强平面波加局部轨道(FP-APW + lo)方法。获得的结果表明,取代的Ta探针杂质会在局部结构上产生强烈的变化。此外,我们在植入Hf-181(-> Ta-181)的具有高结晶度的In2O3样品中进行了精确的时差摄动伽玛-伽玛角相关(TDPAC)关键实验,以获得高质量的电场梯度张量(EFG)消除了文献中解决的争议,并克服了先前报道的TDPAC实验的不同解释。实验是在室温下于空气中进行的,此后在升高的温度下于空气中进行一系列热退火处理的每个步骤之后,以消除辐射损伤并将Hf-181探针定位在取代的阳离子位点。我们成功地获得了两个明确的超精细相互作用,它们被分配给位于In2O3晶体结构的两个无缺陷不等价阳离子位点的Ta-181探针。 EFG计算与这些TDPAC测量的结果非常吻合,表明Ta位置对角EFG的最大成分V-33主要具有p特征。实验的准确性以及可靠而精确的从头算结果使我们可以确定该系统中两个阳离子位点的EFG。需要用缺陷的形成能计算来确定Ta-181杂质的电荷状态,这与In2O3:Ta掺杂系统的半导体特性相符。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号