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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Lithium Intercalation Induced Decoupling of Epitaxial Graphene on SiC(0001): Electronic Property and Dynamic Process
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Lithium Intercalation Induced Decoupling of Epitaxial Graphene on SiC(0001): Electronic Property and Dynamic Process

机译:锂嵌入诱导的SiC(0001)外延石墨烯去耦:电子性质和动力学过程

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摘要

This work presents first-principles investigation of the dynamic process of lithium (Li) penetration through the buffer layer on 6H-SiC(0001) surface as well as the Li-insertion-induced change of electronic structure. It is found that the penetration is kinetically forbidden for perfect buffer layer because of the size confinement of its honeycomb structure. From the analysis of rate coefficient under real experimental conditions, topological defects no smalkr than 8-membered ring are predicted to be essential for Li intercalation. Along with the Li insertion, the electronic property of the buffer layer is changed from n-type doping (Li adsorption) to that of quasi-free-standing graphene (Li intercalation). It is the electron injection by Li that results in the dissociation of the Si-C bonds and the decoupling of Li-intercalated buffer layer fi-om the substrate. Moreover, we demonstrate the influence of such topological defects on the electronic property of epitaxial graphene, whichprovides some useful hints for understanding the observed gap and midgap state behavior.
机译:这项工作提出了第一原理研究锂(Li)穿过6H-SiC(0001)表面上的缓冲层的动态过程,以及锂插入引起的电子结构变化。发现由于完美的缓冲层的蜂窝状结构的尺寸限制,在动力学上禁止渗透。通过在实际实验条件下的速率系数分析,预测除8元环以外没有其他分子的拓扑缺陷对于Li嵌入至关重要。伴随着Li的插入,缓冲层的电子性质从n型掺杂(Li吸附)变为准自立石墨烯(Li嵌入)。是由Li注入的电子导致Si-C键解离和Li插入的缓冲层从基板到表面的解耦。此外,我们证明了这种拓扑缺陷对外延石墨烯电子性能的影响,这为理解观察到的间隙和中间隙状态行为提供了一些有用的提示。

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