首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion
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In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion

机译:In2S3原子层沉积及其在太阳能转换用TiO2纳米管阵列上作为敏化剂的应用

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摘要

In2S3 atomic layer deposition (ALD) with indium acetylacetonate (In(acac)3) and H2S was studied with quartz crystal microbalance (QCM), X-ray reflectivity (XRR), and Fourier transform infrared (FTIR) spectroscopy techniques. Subsequent In2S3 ALD on TiO2 nanotube arrays defined a model semiconductor sensitized solar cell. For In2S3 ALD on initial Al2O3 ALD surfaces, the In2S3 ALD displayed a nucleation period of ~60-70 cycles followed by a linear growth region. These results were obtained under ALD conditions that were not completely self-limiting for the In(acac)3 exposure because of the low In(acac)3 vapor pressure. The growth per cycle decreased at higher temperature over the temperature range from 130 to 170 °C at these same reactant conditions. The growth per cycle was 0.30—0.35 A per cycle at 150 °C as determined by QCM and XRR measurements at higher In(acac)3 exposures where the surface reactions were self-limiting chemistry versus In(acac)3 and H2S exposures. The FTIR examinations revealed that the nucleation period on Al2O3 ALD surfaces may be related to the formation of Al(acac)* species that act to poison the initial Al2O3 ALD surface. X-ray diffraction investigations revealed β-In2S3 ALD films and X-ray photoelectron measurements were consistent with In2S3 films. The In2S3 ALD was employed as a semiconductor sensitizer on TiO2 nanotube arrays for solar conversion. Scanning electron microscopy and energy dispersive X-ray analysis imaging revealed In2S3 over the full length of the TiO2 nanotube array after 175 cycles of In2S3 ALD at 150 °C at reactant exposure conditions that were self-limiting on flat substrates. The photoelectrochemical properties of these In2S3 ALD-sensitized TiO2 nanotube arrays with a Co~(2+)/Co~(3+) electrolyte were then characterized by measuring the photocurrent density versus voltage and the external quantum efficiency versus photon energy. A small quantum efficiency of ~10% was observed that can be attributed to charge recombination losses and charge injection/collection processes.
机译:利用石英晶体微量天平(QCM),X射线反射率(XRR)和傅里叶变换红外(FTIR)光谱技术研究了乙酰丙酮铟(In(acac)3)和H2S的In2S3原子层沉积(ALD)。 TiO2纳米管阵列上随后的In2S3 ALD定义了模型半导体敏化太阳能电池。对于初始Al2O3 ALD表面上的In2S3 ALD,In2S3 ALD表现出约60-70个循环的成核周期,随后是线性生长区域。这些结果是在ALD条件下获得的,该条件由于In(acac)3蒸气压低而不能完全限制In(acac)3的暴露。在这些相同的反应条件下,在130至170°C的温度范围内,较高温度下,每个循环的生长降低。通过在较高的In(acac)3暴露量下进行QCM和XRR测量,在150°C下,每个周期的生长量为0.30-0.35 A,其中In(acac)3和H2S暴露是表面自限化学反应。 FTIR检查表明,Al2O3 ALD表面上的成核时间可能与Al(acac)*物种的形成有关,该物种起毒作用于最初的Al2O3 ALD表面。 X射线衍射研究显示β-In2S3ALD膜,X射线光电子测量结果与In2S3膜一致。 In2S3 ALD被用作TiO2纳米管阵列上的半导体敏化剂,用于太阳能转换。扫描电子显微镜和能量色散X射线分析成像显示In2S3 ALD在150°C下的175个In2S3 ALD循环中,在反应剂暴露条件下(在平坦基板上具有自限性),在TiO2纳米管阵列的全长上存在In2S3。然后通过测量光电流密度与电压的关系以及外部量子效率与光子能量的关系来表征这些具有Co〜(2 +)/ Co〜(3+)电解质的In2S3 ALD敏化TiO2纳米管阵列的光电化学性质。观察到约10%的小量子效率,这可归因于电荷重组损失和电荷注入/收集​​过程。

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