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首页> 外文期刊>The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical >Shear Deformation and Division of Cylindrical Walls in Free-Standing Nematic Films under High Electric Fields
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Shear Deformation and Division of Cylindrical Walls in Free-Standing Nematic Films under High Electric Fields

机译:自由电场下向列型薄膜在高电场下的剪切变形和圆柱壁的划分

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We report on the behavior of cylindrical walls formed in a substrate-free nematic film of PCH5 under the action of an in-plane ac field. In the film, with vertical molecular alignment at all the limiting surfaces, annular Brochard—Leger walls are induced well above the bend—Freedericksz threshold. They exhibit, at high field strengths, a new type of instability not encountered in sandwich, or any other, cell configuration. It manifests as a shearing of the loop-wall between the opposite free-surfaces. The shear strain is measured as a function of time, field strength, frequency, and temperature. Significantly, the strain is linear in field strength. The origin of shear and its dependence on field variables are explained through an adaptation of the Can—Helfrich mechanism of charge separation. The sheared wall is stable against pincement up to several times the threshold field, and divides itself into two fragments under a large enough strain. With the shear distortion, linear defects appear in the opposite splay-bend regions, just as Neel lines in Bloch walls of magnetic systems. At very low frequencies, flexoelectric influence on distortion is revealed.
机译:我们报告了在平面交流场的作用下,在无底物的PCH5向列膜中形成的圆柱壁的行为。在薄膜中,在所有限制表面上都具有垂直的分子排列方式,在弯曲-Freedericksz阈值之上大大诱导了环形Brochard-Leger壁。它们在高场强下表现出一种新型的不稳定性,这种不稳定性是三明治或其他任何单元结构所没有的。它表现为相对的自由表面之间的环形墙的剪切。剪切应变是时间,场强,频率和温度的函数。明显地,应变场强是线性的。通过改编Can-Helfrich电荷分离机制,解释了剪切的起源及其对场变量的依赖性。剪力墙在高达阈值场的几倍的情况下仍能稳定抵御松动,并在足够大的应变下将自身分成两个碎片。由于剪切变形,线性缺陷出现在相对的张开弯曲区域,就像磁性系统的布洛赫壁中的尼尔线一样。在非常低的频率下,显示出挠曲对变形的影响。

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