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Excellent Field-Emission Properties of P-Doped GaN Nanowires

机译:P掺杂GaN纳米线的出色场发射特性

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摘要

GaN nanowires with P doping were synthesized via a simple thermal evaporation process.The P-doped GaN nanowires have average diameters of approx 100 nm and lengths up to tens of micrometers.Scanning electron microscope and high-resolution field-emission transmission electron microscope analyses revealed that P doping results in a rough surface morphology of GaN nanowires.Field-emission measurements showed that P doping effectively decreases the turn-on field of GaN nanowire to 5.1 V/mum,holding promise of application as an electron emitter.The rough surface is responsible for enhancement of the field-emission properties of GaN nanowires.
机译:通过简单的热蒸发工艺合成了具有P掺杂的GaN纳米线.P掺杂的GaN纳米线的平均直径约为100 nm,长度可达数十微米。扫描电子显微镜和高分辨率场发射透射电子显微镜分析显示P掺杂会导致GaN纳米线的表面形态粗糙。场发射测量表明,P掺杂有效地将GaN纳米线的导通场降低至5.1 V /μm,这有望用作电子发射器。负责增强GaN纳米线的场发射特性。

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