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首页> 外文期刊>Physica, B. Condensed Matter >Epitaxial growth of delafossite CuFeO _2 thin films by pulse laser deposition
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Epitaxial growth of delafossite CuFeO _2 thin films by pulse laser deposition

机译:脉冲激光沉积外延铜铁矿CuFeO _2薄膜的外延生长

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CuFeO _2 (CFO) is a delafossite-type compound and is a well known p-type semiconductor. Epitaxial CuFeO _2 thin films were prepared on Al _2O _3 (0 0 0 1) substrates by pulsed laser deposition. The deposition, performed at 500 °C and 10 Pa leads to epitaxial phase with extremely low roughness and high density. The oxygen pressure modulates the band energy properties of Cu 2p, Fe 3p and O1s. The results show that the low deposition oxygen pressure contributes to the chemistry ingredient and magnetization properties. Furthermore, spin-glass behavior is identified and weak-ferromagnetization property is found at a low temperature about ~5 K.
机译:CuFeO _2(CFO)是铜铁矿型化合物,并且是众所周知的p型半导体。通过脉冲激光沉积在Al _2O _3(0 0 0 1)衬底上制备了外延CuFeO _2薄膜。在500°C和10 Pa的条件下进行的沉积会导致具有极低粗糙度和高密度的外延相。氧气压力调节Cu 2p,Fe 3p和O1s的能带性能。结果表明,低的沉积氧压有助于化学成分和磁化性能。此外,在约5 K的低温下,可以确定自旋玻璃的行为并发现弱铁磁化性能。

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