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Theoretical prediction of electronic structures and optical properties of Y-doped gamma-Si3N4

机译:Y掺杂γ-Si3N4电子结构和光学性质的理论预测

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The crystal structures, electronic structures, and optical properties of Y-doped gamma-Si3N4 were studied by using first-principles calculations based upon the density functional theory with Perdew-Burke-Enzerh (PBE) generalized gradient approximation (GGA). The band gap (E-g) of Y-doped gamma-Si3N4 is found to significantly decrease in comparison to that Of gamma-Si3N4. The calculated E-g suggests that gamma-Si3N4 doped with low Y content can be used in the window or absorption material of solar cell, while those doped with high Y concentrations can show metal behavior. The calculation of optical properties shows that the static dielectric constant of gamma-Si3N4 doped with Y is much higher than that of the undoped gamma-Si3N4, implying its special applications in electronics and optics.
机译:基于第一性原理,基于密度泛函理论,采用Perdew-Burke-Enzerh(PBE)广义梯度近似(GGA),研究了掺Y的γ-Si3N4的晶体结构,电子结构和光学性质。发现与γ-Si3N4的带隙相比,Y掺杂的γ-Si3N4的带隙(E-g)显着减小。计算出的E-g表明,掺入低Y含量的γ-Si3N4可用于太阳能电池的窗口或吸收材料,而掺入高Y浓度的γ-Si3N4可表现出金属行为。光学性质的计算表明,掺Y的γ-Si3N4的静态介电常数比未掺杂的γ-Si3N4的静态介电常数高得多,这意味着其在电子和光学领域的特殊应用。

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