Submicrometer photonic structure fabrication by phase spatial-light-modulator-based interference lithography

摘要

We present a large-area and single-step fabrication approach based on phase spatial light modulator (SLM)-assisted interference lithography for the realization of submicrometer photonic structures on photoresist. A multimirror beam steering unit is used to reflect the SLM-generated phase-engineered beams leading to a large angle between interfering beams while also preserving the large area of the interfering plane beams. Both translational and rotational periodic submicrometer structures are experimentally realized. This approach increases the flexibility of interference lithography to fabricate more complex submicrometer photonic structures and photonic metamaterial structures for future applications. (C) 2016 Optical Society of America