Phase Controlled Interference lithography: A dynamic tool for large-area fabrication of nano-photonic structures

摘要

The field of nanophotonics is a fascinating branch of optics that has shown a whole new-perspective of light-matter interaction, or more specifically the controlling or 'molding the flow' of light. Periodic nanostructures in one, two, and three dimensions have been the active block of such light-manipulation, resulting in numerous applications and finally emerging as one of the interesting fields of the science community in the last decade. Such applications range from filtering, optical guiding, field enhancing, confinement/light-trapping optical computing, signal processing towards a whole set of parametric sensing that can affect the resonance mechanism associated with these nanophotonic structures. Although there are a series of fabrication approaches, the present review article covers the state of the art in 'phase-controlled interference-lithography' based fabrication technique for different application-oriented possibilities, utilizing the benefits of scalability and reconfigurability.