首页> 外国专利> Method for producing large-area fine pattern using laser interference lithography, non-planar transfer method for fine pattern produced using the method, and article having fine pattern transferred using the same

Method for producing large-area fine pattern using laser interference lithography, non-planar transfer method for fine pattern produced using the method, and article having fine pattern transferred using the same

机译:使用激光干涉光刻生产大面积精细图案的方法,用于使用该方法制备的精细图案的非平面转印方法以及具有使用该方法转印的精细图案的制品

摘要

The present invention relates to a method for the non-planar transfer of a fine pattern and to an article to which the fine pattern is transferred by the transfer method. More particularly, the present invention relates to a method for the non-planar transfer of a fine pattern and to an article to which the fine pattern is transferred by the transfer method, wherein the method coats an upper surface of a substrate having a flat structure with a sacrificial layer and a pattern forming layer, forms a fine pattern into a large area on the coated pattern forming layer, separates the pattern forming layer on which the fine pattern is transferred, and attaches the separated pattern forming layer to an object article.
机译:本发明涉及一种用于精细图案非平面转移的方法,并且涉及一种通过转移方法将精细图案转移到其上的物品。更具体地,本发明涉及一种用于非平面地转印精细图案的方法,并且涉及一种通过转印方法将精细图案转印到其上的物品,其中该方法涂覆具有平坦结构的基板的上表面。具有牺牲层和图案形成层的图案,在涂覆的图案形成层上大面积地形成精细图案,将其上转印有精细图案的图案形成层分离,并将分离的图案形成层附着至目标物品。

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