首页>
外国专利>
Method for producing large-area fine pattern using laser interference lithography, non-planar transfer method for fine pattern produced using the method, and article having fine pattern transferred using the same
Method for producing large-area fine pattern using laser interference lithography, non-planar transfer method for fine pattern produced using the method, and article having fine pattern transferred using the same
The present invention relates to a method for the non-planar transfer of a fine pattern and to an article to which the fine pattern is transferred by the transfer method. More particularly, the present invention relates to a method for the non-planar transfer of a fine pattern and to an article to which the fine pattern is transferred by the transfer method, wherein the method coats an upper surface of a substrate having a flat structure with a sacrificial layer and a pattern forming layer, forms a fine pattern into a large area on the coated pattern forming layer, separates the pattern forming layer on which the fine pattern is transferred, and attaches the separated pattern forming layer to an object article.
展开▼