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High quality factor nitride-based optical cavities: microdisks with embedded GaN/Al(Ga)N quantum dots

机译:高质量因数氮化物基光腔:带有嵌入式GaN / Al(Ga)N量子点的微盘

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摘要

We compare the quality factor values of the whispering gallery modes of microdisks (mu-disks) incorporating GaN quantum dots (QDs) grown on AlN and AlGaN barriers by performing room temperature photoluminescence (PL) spectroscopy. The PL measurements show a large number of high Q factor resonant modes on the whole spectrum, which allows us to identify the different radial mode families and to compare them with simulations. We report a considerable improvement of the Q factor, which reflects the etching quality and the relatively low cavity loss by inserting QDs into the cavity. GaN/AlN QDs-based mu-disks show very high Q values (Q > 7000) whereas the Q factor is only up to 2000 in mu-disks embedding QDs grown on the AlGaN barrier layer. We attribute this difference to the lower absorption below bandgap for AlN barrier layers at the energies of our experimental investigation.
机译:我们通过执行室温光致发光(PL)光谱比较了掺入在AlN和AlGaN势垒上生长的GaN量子点(QDs)的微盘(mu-disk)的回音壁模式的品质因子值。 PL测量在整个频谱上显示出大量的高Q因子共振模式,这使我们能够识别不同的径向模式族并将其与仿真进行比较。我们报告了Q值的显着改善,它通过将QD插入腔体来反映蚀刻质量和相对较低的腔体损耗。基于GaN / AlN QD的mu磁盘显示出非常高的Q值(Q> 7000),而在将QD嵌入在AlGaN势垒层上的mu磁盘中,Q值仅高达2000。我们将此差异归因于在我们的实验研究能量下,AlN势垒层的能隙低于能隙。

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