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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Adsorption Isotherms and Structure of Cationic Surfactants Adsorbed on Mineral Oxide Surfaces Prepared by Atomic Layer Deposition
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Adsorption Isotherms and Structure of Cationic Surfactants Adsorbed on Mineral Oxide Surfaces Prepared by Atomic Layer Deposition

机译:原子层沉积法在矿物氧化物表面吸附阳离子表面活性剂的吸附等温线和结构

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The adsorption isotherms and aggregate structures of adsorbed surfactants on smooth thin-film surfaces of mineral oxides have been studied by optical reflectometry and atomic force microscopy (AFM). Films of the mineral oxides of titania, alumina, hafnia, and zirconia were produced by atomic layer deposition (ALD) with low roughness. We find that the surface strongly influences the admicelle organization on the surface. At high concentrations (2 × cmc) of cetyltrimethylammonium bromide (CTAB), the surfactant aggregates on a titania surface exhibit a flattened admicelle structure with an average repeat distance of 8.0 ± 1.0 nm whereas aggregates on alumina substrates exhibit a larger admicelle with an average separation distance of 10.5 ± 1.0 nm. A wormlike admicelle structure with an average separation distance of 7.0 ± 1.0 nm can be observed on zirconia substrates whereas a bilayered aggregate structure on hafnia substrates was observed. The change in the surface aggregate structure can be related to an increase in the critical packing parameter through a reduction in the effective headgroup area of the surfactant. The templating strength of the surfaces are found to be hafnia > alumina > zirconia > titania. Weakly templating surfaces are expected to have superior biocompatibility.
机译:通过光学反射法和原子力显微镜(AFM)研究了在矿物氧化物的光滑薄膜表面上吸附的表面活性剂的吸附等温线和聚集体结构。二氧化钛,氧化铝,氧化f和氧化锆的矿物氧化物膜是通过低粗糙度的原子层沉积(ALD)制成的。我们发现,表面强烈影响表面上的菌丝组织。在高浓度(2×cmc)的十六烷基三甲基溴化铵(CTAB)下,二氧化钛表面的表面活性剂聚集体呈现出扁平的胶束结构,平均重复距离为8.0±1.0 nm,而氧化铝基材上的聚集体表现出较大的胶束且具有平均分离度距离为10.5±1.0 nm。在氧化锆基底上可以观察到蠕虫状的平均间距为7.0±1.0 nm的虫状结构,而在氧化f基底上则可以看到双层聚集体结构。通过降低表面活性剂的有效头基面积,表面聚集体结构的变化可能与临界堆积参数的增加有关。发现表面的模板强度为氧化f>氧化铝>氧化锆>二氧化钛。模板薄弱的表面有望具有优异的生物相容性。

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