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Effect of Multilayer Adsorption of Cationic Surfactants on the Electrodeposition of Cobalt

机译:阳离子表面活性剂多层吸附对钴电沉积的影响

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It has been shown that the addition of the surfactant tetrabutyl- ammonium perchlorate (TBAP) causes a periodic increase and decrease in the rate of deposition of cobalt as the concentration of surfactant is increased. This is interpreted as another example of the effect on the rate of surface reactions of the formation of alternating hydro-phobic-hydraulic surfaces caused by Langmuir-Blodgett type films on metals. Electrodeposition, Cobalt, Surfactants, Multilayer. (jes)

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