首页> 外文期刊>ACS applied materials & interfaces >Flexible Solar Cells Using Doped Crystalline Si Film Prepared by Self-Biased Sputtering Solid Doping Source in SiCl4/H-2 Microwave Plasma
【24h】

Flexible Solar Cells Using Doped Crystalline Si Film Prepared by Self-Biased Sputtering Solid Doping Source in SiCl4/H-2 Microwave Plasma

机译:使用自偏置溅射固体掺杂源在SiCl4 / H-2微波等离子体中制备的掺杂晶体Si膜的柔性太阳能电池

获取原文
获取原文并翻译 | 示例
       

摘要

We developed an innovative approach of self-biased sputtering solid doping source process to synthesize doped crystalline Si film on flexible polyimide (PI) substrate via microwave-plasma-enhanced chemical vapor deposition (MWPECVD) using SiCl4/H-2 mixture. In this process, P dopants or B dopants were introduced by sputtering the solid doping target through charged-ion bombardment in situ during high-density microwave plasma deposition. A strong correlation between the number of solid doping targets and the characteristics of doped Si films was investigated in detail. The results show that both P- and B-doped crystalline Si films possessed a dense columnar structure, and the crystallinity of these structures decreased with increasing the number of solid doping targets. The films also exhibited a high growth rate (>4.0 nm/s). Under optimal conditions, the maximum conductivity and corresponding carrier concentration were, respectively, 9.48 S/cm and 1.2 x 10(20) cm(-3) for P-doped Si film and 7.83 S/cm and 1.5 X 10(20) cm(-3) for B-doped Si film. Such high values indicate that the incorporation of dopant with high doping efficiency (around 40%) into the Si films was achieved regardless of solid doping sources used. Furthermore, a flexible crystalline Si film solar cell with substrate configuration was fabricated by using the structure of PI/Mo film-type Si film/i-type Si film/p-type Si film/ITO film/Al grid film. The best solar cell performance was obtained with an open-circuit voltage of 0.54 V, short-circuit current density of 19.18 mA/cm(2), fill factor of 0.65, and high energy conversion of 6.75%. According to the results of bending tests, the critical radius of curvature (Re) was 12.4 mm, and the loss of efficiency was less than 1% after the cyclic bending test for 100 cycles at R-C, indicating superior flexibility and bending durability. These results represent important steps toward a low-cost approach to high-performance flexible crystalline Si film-based photovoltaic devices.
机译:我们开发了一种创新的自偏置溅射固体掺杂源工艺,该工艺通过使用SiCl4 / H-2混合物的微波等离子体增强化学气相沉积(MWPECVD)在柔性聚酰亚胺(PI)衬底上合成掺杂的晶体Si膜。在该过程中,通过在高密度微波等离子体沉积过程中通过带电离子轰击原位溅射固体掺杂靶来引入P掺杂剂或B掺杂剂。详细研究了固体掺杂靶的数目与掺杂的Si膜的特性之间的强相关性。结果表明,P和B掺杂的晶体Si膜均具有致密的柱状结构,并且这些结构的结晶度随着固体掺杂靶的数目的增加而降低。膜还表现出高生长速率(> 4.0 nm / s)。在最佳条件下,P掺杂硅膜的最大电导率和相应的载流子浓度分别为9.48 S / cm和1.2 x 10(20)cm(-3),7.83 S / cm和1.5 X 10(20)cm (-3)用于B掺杂的Si膜。如此高的值表明,与所使用的固体掺杂源无关,都将具有高掺杂效率(约40%)的掺杂剂掺入到Si膜中。此外,通过使用PI / Mo膜/ n型Si膜/ i型Si膜/ p型Si膜/ ITO膜/ Al栅格膜的结构来制造具有基板构造的柔性晶体Si膜太阳能电池。开路电压为0.54 V,短路电流密度为19.18 mA / cm(2),填充系数为0.65,高能量转换率为6.75%,可获得最佳的太阳能电池性能。根据弯曲试验的结果,临界曲率半径(Re)为12.4 mm,在R-C进行100次循环弯曲试验后,效率损失小于1%,表明具有优异的柔韧性和弯曲耐久性。这些结果代表了朝着低成本途径发展高性能柔性晶体硅膜基光伏器件的重要步骤。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号