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首页> 外文期刊>ACS applied materials & interfaces >Realization of Metal-Insulator Transition and Oxidation in Silver Nanowire Percolating Networks by Terahertz Reflection Spectroscopy
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Realization of Metal-Insulator Transition and Oxidation in Silver Nanowire Percolating Networks by Terahertz Reflection Spectroscopy

机译:太赫兹反射光谱法在银纳米线渗滤网络中金属-绝缘体的转变和氧化的实现

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摘要

Metal nanowires (NWs) enable versatile applications in printed electronics and optoelectronics by serving as thin and flexible transparent electrodes. The performance of metal NWs as thin electrodes is highly correlated to the connectivity of NW meshes. The percolation threshold of metal NW films corresponds to the minimum density of NWs to form the transparent, yet conductive metal NW networks. Here, we determine the percolation threshold of silver NW (AgNW) networks by using morphological analysis and terahertz (THz) reflection spectroscopy. From the divergent behavior of carrier scattering time and the increase of carrier backscattering factor, the critical NW density at which crossover from Drude to non-Drude behavior of THz conductivity occurs can be unambiguously determined for AgNW thin films. Furthermore, the natural oxidation of AgNWs which causes the gradual reduction of the connectivity of the AgNW network is also realized by the THz spectroscopy. The selective oxidation of NW-to-NW junctions weakens the ohmic contact, and for AgNWs near a critical density, it can even lead to metal-insulator transition. The presented results offer invaluable information to accelerate the deployment of metal nanowires for next-generation electronics and optoelectronics on flexible substrates.
机译:金属纳米线(NWs)通过用作薄且柔软的透明电极,可在印刷电子和光电子学中实现多种应用。金属NW作为薄电极的性能与NW网格的连通性高度相关。金属NW膜的渗透阈值对应于NW的最小密度,以形成透明而导电的金属NW网络。在这里,我们通过形态分析和太赫兹(THz)反射光谱法确定了NW银(AgNW)网络的渗透阈值。从载流子散射时间的发散行为和载流子反向散射因子的增加,可以明确地确定AgNW薄膜从Drude跨越到THz电导率的非Drude行为的临界NW密度。此外,太赫兹光谱还实现了导致AgNW网络连通性逐渐降低的AgNW的自然氧化。 NW到NW结的选择性氧化会削弱欧姆接触,对于接近临界密度的AgNW,它甚至可能导致金属-绝缘体转变。提出的结果提供了宝贵的信息,可加快金属纳米线在柔性基板上的部署,以用于下一代电子产品和光电产品。

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