Evaluation of low-k porous silica films incorporated with ethylene groups

摘要

Porous silica films incorporated with ethylene groups prepared by using hydrolysis and condensation of BIS(Triethoxysillyl)Ethylene [BTE] and H{sub}20 contained with HCl as a catayst and 2-Methylpentane-2,4-diol [MPD] ws evaluated. FTIR peaks due to MPD were not observed in the film even after 450℃. This result was also confirmed by thermal-programmed desorption [TPD] measurement. Electric characteristics were evaluated with MOS structure. The k value was not depend on the annealing temperature below 400℃, however, it was reduced down to 1.9 at 450℃. Density of the film evaluated by x-ray reflectance measurement was about 1.Og/cm{sup}3 and porosity was about 56%.