Temperature Dependence of Porogen Desorption from Low-k Porous Silica Films Incorporated with Ethylene Groups

摘要

The temperature dependence of porogen desorption from low-k silica films incorporated with ethylene groups was investigated. Total-reflection X-ray measurement indicated that porogen desorption characteristics strongly depended on temperature and time. The time required for film annealing at 400℃ was 3 h, while that required for film annealing at 375℃ was 8 h. These results were confirmed by temperature desorbing spectra measurement. The film vacuum annealed at 375℃ for 8h did not show that the peaks came from porogen.