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首页> 外文期刊>電子情報通信学会技術研究報告. シリコン材料·デバイス. Silicon Devices and Materials >Dependence of light intensity for magnetoresistance effect of four-terminal Si MOSFET induced by lateral magnetic field - property of four-terminal MOSFET due to light irradiation and magnetic field
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Dependence of light intensity for magnetoresistance effect of four-terminal Si MOSFET induced by lateral magnetic field - property of four-terminal MOSFET due to light irradiation and magnetic field

机译:光强与横向磁场引起的四端MOSFET的磁阻效应的关系-四端MOSFET的光辐射和磁场特性

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摘要

The photoconductive effect in a four-terminal n-channel MOSFET was generated due to light irradiation. The drain current I{sub}D and the channel-base current I{sub}(CB) were saturated with the illuminance E{sub}L. The I{sub}D decreased due to magnetic field and its parallel relative sensitivity of magnetic effect S{sub}(RD) was independent of the drain voltage V{sub}D. The S{sub}(RD) was saturated with the E{sub}L and increased in proportion to the magnetic flux density B. On the other hand, the I{sub}(CB) decreased due to magnetic field under light irradiation and its vertical relative sensitivity of magnetic effect S{sub}(RT) was independent of the E{sub}L, but decreased due to light irradiation. The maximum value of S{sub}(RD) was 1.7 %/T when V{sub}D=0.5 V, B=1.0 T, E{sub}L=5610 lx. In this report, the change of I{sub}D, I{sub}(CB) S{sub}(RD) and S{sub}(RT) due to light irradiation and magnetic field was considered.
机译:由于光照射,在四端n沟道MOSFET中产生了光电导效应。漏极电流I {D}和沟道基极电流I {sub}(CB)被照度E {sub} L饱和。 I {D} D由于磁场而减小,并且其平行的磁效应S {sub}(RD)的相对灵敏度与漏极电压V {sub} D无关。 S {sub}(RD)被E {sub} L饱和,并与磁通密度B成正比。另一方面,I {sub}(CB)由于光照射下的磁场而减小,并且其磁效应S {sub}(RT)的垂直相对灵敏度与E {sub} L无关,但由于光照射而降低。当V {sub} D = 0.5 V,B = 1.0 T,E {sub} L = 5610 lx时,S {sub}(RD)的最大值为1.7%/ T。在此报告中,考虑了由于光辐照和磁场导致的I {sub} D,I {sub}(CB)S {sub}(RD)和S {sub}(RT)的变化。

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