Applications of Electron Microscopy in the Research on Metal Silicides

摘要

Metal silicide thin films have been an integral part of integrated circuits. In recent years, increasing attention has been directed to the low dimensional metal silicide systems owing to their importance in enhancing fundamental understanding of the interfacial reactions between metal and silicon as well as in a variety of applications. In this article, a brief introduction is made with particular emphasis on the applications of electron microscopy to the metal silicide research. With the vast potential for the novel and practical applications of metal silicides, continuing and vigorous efforts in research with electron microscopy playing a vital part are foreseen.