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Electrical Characteristics of Surface Stoichiometry Controlled p-GaN Schottky Contacts

机译:表面化学计量控制的p-GaN肖特基接触的电特性

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Experimental results of electrical characteristics of Au/Ni Schottky contacts formed on three kinds of p-GaN layers, which were grown at different turn-off temperatures (300, 600, and 900℃) of an NH_3 gas supply (T_(NH_3)) on cooling down at the end of the growth to control the surface stoichiometry. In the internal photoemission results, the Schottky barrier heights of all the samples were as high as around 2.2 eV, and a slight increase by 0.1 eV was observed when the T_(NH_3) decreased from 900 to 300℃. At the same time, carrier capture and emission from accepter-like mid-gap level defects decreased as the T_(nh_3) decrease. The N-rich cooling-down condition tends to passivate the acceptor type defects or create donor type defects for the compensation, and the pinning position at the interface might be moved to the conduction band edge slightly.
机译:在NH_3供气(T_(NH_3))的不同关断温度(300、600和900℃)下生长的三种p-GaN层上形成的Au / Ni肖特基接触的电特性的实验结果在生长结束时冷却以控制表面化学计量。在内部光发射结果中,所有样品的肖特基势垒高度都高达2.2 eV,当T_(NH_3)从900℃降至300℃时,观察到的肖特基势垒高度略有增加,为0.1 eV。同时,随着T_(nh_3)的降低,载子的捕获和类似受体中能级能级缺陷的发射降低。富氮的冷却条件倾向于钝化受体型缺陷或产生供体型缺陷以进行补偿,并且界面处的钉扎位置可能会稍微移至导带边缘。

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