Influence of technological of process PVD on phase and chemical composition of coating on a basis titanium nitride

摘要

In the basic technological parameters of process PVD (the condensation of a coating front a plasma phase with ion bombardment)is: pressure of reactionary gas. potential of displacement, current of the category, In the article it is considered the influence of technological parameters to structure, structure and properties of coatings. Data on phase structure titanium nitride of coating are resulted (brought) which depending on modes has phase structure TiN, #alpha#-Ti+TiN or #alpha#-Ti+Ti_2N+TiN. It investigated structure of phases titanium nitride. With the hep micro X-rag spectral analyses it is established the structure of phases titanium nitride of a coating TiN_(0,84).