PVD of titanium aluminum nitride coatings for metal substrates, e.g. high speed steel or tungsten carbide cutting or working tools, comprises vanadium ion etching of the substrate surfaces prior to coating

摘要

A PVD process for coating metal substrates with TiAlN comprises etching the substrate surfaces with V ions prior to coating. The V ions originate from cathodic arc discharge vapor deposition and the substrate is negatively biased at 600-1400 V during etching.