首页> 外文期刊>Journal of the Korean Physical Society >Temperature-dependent Catalyst-free Growth of ZnO Nanostructures on Si and SiO_2/Si Substrates via Thermal Evaporation
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Temperature-dependent Catalyst-free Growth of ZnO Nanostructures on Si and SiO_2/Si Substrates via Thermal Evaporation

机译:通过热蒸发在Si和SiO_2 / Si衬底上无温度依赖地生长ZnO纳米结构

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The catalyst-free growth of ZnO nanostructures on Si and SiO_2/Si substrates as a function of substrate temperature was carried out using a thermal evaporation method. We observed that the shapes and the morphologies of the ZnO nanostructures could be controlled by using the substrate temperature and the presence of an oxide layer on the surface of the substrate. The shape of the ZnO nanostructure was changed from an embossed nanocantilever to a nanowire as the growth temperature was decreased from 500 ℃ to 430 ℃. At 360 ℃, a winding stem-like nanostructure with thin and short branch nanowires on the facet of the nanostructure was produced. In particular, at a growth temperature of 430 ℃, a ZnO buffer layer was formed during the initial growth when an Si substrate was used. However, no ZnO buffer layer was observed when a SiO_2/Si substrate was used. The formation of a buffer layer significantly affected the crystalline structure. Defects were observed in the embossed nanocantilevers and the nanowires grown on SiO_2/Si but not in those grown on Si.
机译:使用热蒸发法进行了在Si和SiO_2 / Si衬底上ZnO纳米结构的无催化剂生长,这是衬底温度的函数。我们观察到,ZnO纳米结构的形状和形态可以通过使用衬底温度和衬底表面上氧化物层的存在来控制。随着生长温度从500℃降低到430℃,ZnO纳米结构的形状从压花纳米悬臂变为纳米线。在360℃下,产生了缠绕的茎状纳米结构,其在纳米结构的表面上具有短而短的分支纳米线。特别是,在430℃的生长温度下,使用Si衬底时,在初始生长过程中会形成ZnO缓冲层。然而,当使用SiO_2 / Si衬底时,没有观察到ZnO缓冲层。缓冲层的形成显着影响晶体结构。在压纹的纳米悬臂和在SiO_2 / Si上生长的纳米线中观察到缺陷,但在Si上生长的纳米线中未观察到缺陷。

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