首页> 外文期刊>Journal of Ceramic Processing Research. (Text in English) >Catalyst-free growth of ZnO nanowires on Si (100) substrates by thermal evaporation
【24h】

Catalyst-free growth of ZnO nanowires on Si (100) substrates by thermal evaporation

机译:通过热蒸发在Si(100)衬底上无催化剂生长ZnO纳米线

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Vertically well-aligned ZnO nanowires with a high density were successfully grown on Si (100) substrates without a catalyst by conventional thermal evaporation. The grown ZnO nanowires are relatively uniform in diameter of about 180 nm and length of about 4 |xm. They exhibit the morphological features of faceted planes at the tips of hexagonal columns and are preferentially oriented along the [001] direction. The optimum growth condition was obtained from the experimental result that the degree of vertical alignment of the ZnO nanowires depends sensitively on the distance between the substrate and the Zn source. The PL characteristics of the grown ZnO nanowires reveal a strong and sharp UV emission at 380 nm and a broad green emission in the region of 500 nm, indicating excellent optical properties.
机译:通过常规的热蒸发法,在没有催化剂的情况下,在Si(100)衬底上成功地生长了高密度垂直良好排列的ZnO纳米线。生长的ZnO纳米线的直径约为180nm,长度约为4μm,相对均匀。它们在六角柱的顶端显示出刻面的形态特征,并优先沿[001]方向取向。从实验结果获得最佳生长条件,即ZnO纳米线的垂直排列程度敏感地取决于衬底和Zn源之间的距离。生长的ZnO纳米线的PL特性在380 nm处显示出强烈而尖锐的UV发射,并在500 nm处显示出较宽的绿色发射,这表明其具有出色的光学性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号