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首页> 外文期刊>Journal of the Korean Physical Society >Inkjet-Printed Silver Gate Electrode and Organic Dielectric Materials for Bottom-Gate Pentacene Thin-Film Transistors
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Inkjet-Printed Silver Gate Electrode and Organic Dielectric Materials for Bottom-Gate Pentacene Thin-Film Transistors

机译:底栅并五苯薄膜晶体管的喷墨印刷银栅电极和有机介电材料

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摘要

An inkjet-printed silver electrode and a spin-coated cross-linked poly(4-vinylphenol)(PVP) dielectric layer were used as a gate electrode and a gate insulator for a bottom-gate pentacene thin-film transistor (TFT), respectively. The printing and the curing conditions of the printed silver electrode were optimized and tested on various substrates, such as glass, silicon, silicon dioxide, polyethersulfone, polyethyleneterephthalate, polyirnide and polyarylate, to produce a good sheet resistance of 0.2~0.4 Ω/□ and a good surface roughness of 2.38 nm in RMS value and 20.14 nm in peak-to-valley (P2V) value, which are very similar to those of conventionally-sputtered indium-tin_oxide (ITO) or thermally-evaporated silver electrodes. The coated PVP layer of metal/PVP/metal devices showed a good insulation property of 10.4 nA/cm~2 at 0.5 MV/cm. The PVP layer further reduced the surface roughness of the gate electrode to provide a good interface to the pentance layer. The pentacene TFT with a structure of glass/printed silver/PVP/pentacene/Au showed a good saturation region mobility of 0.13 cm~2/Vs and a good on/off ratio of larger than 105, which are similar to the performance of a pentacene TFT with a conventional ITO gate electrode.
机译:喷墨印刷的银电极和旋涂交联的聚(4-乙烯基苯酚)(PVP)电介质层分别用作底栅并五苯薄膜晶体管(TFT)的栅电极和栅绝缘体。优化了印刷银电极的印刷和固化条件,并在玻璃,硅,二氧化硅,聚醚砜,聚对苯二甲酸乙二醇酯,聚酰亚胺和聚芳酯等各种基材上进行了测试,以产生0.2〜0.4Ω/□的良好薄层电阻。 RMS值和峰谷(P2V)值分别为2.38 nm和20.14 nm的良好表面粗糙度,这与常规溅射的铟锡氧化物(ITO)或热蒸发银电极非常相似。金属/ PVP /金属器件的涂层PVP层在0.5 MV / cm时表现出10.4 nA / cm〜2的良好绝缘性能。 PVP层进一步降低了栅电极的表面粗糙度,以提供与苦味层的良好界面。具有玻璃/印刷银/ PVP /并五苯/ Au结构的并五苯TFT表现出0.13 cm〜2 / Vs的良好饱和区迁移率和大于105的良好开/关比,这与a的性能相似。具有常规ITO栅电极的并五苯TFT。

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