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首页> 外文期刊>Journal of the Korean Physical Society >Photoelectric Effects on the Photocurrent of an a-Si:H Thin Film Transistor due to the Spectral Properties of Backlight Sources
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Photoelectric Effects on the Photocurrent of an a-Si:H Thin Film Transistor due to the Spectral Properties of Backlight Sources

机译:背光源的光谱特性对a-Si:H薄膜晶体管的光电流的光电效应

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摘要

An inverted staggered-type hydrogenated amorphous-silicon thin-film transistor (a-Si:H TFT) was fabricated with a protrusion of the a-Si:H layer and its photocurrent was obtained for various backlight sources, such as a cold cathode fluorescent lamp (CCFL) and a RGB light-emitting diode (LED). Although the backlight sources had similar luminances, different photocurrents were obtained and the results were analyzed in terms of the spectral characteristics of the backlight sources instead of the luminance. The results show that the photocurrent is related to the electron-hole pairs generated in the a-Si:H layer and that the generation depends on the wavelength of the peak intensity in the spectral properties of backlight sources because the absorption of the incident light is mainly carried out at a wavelength of less than 500__600 nm. From the relationship between the backlight sources and the photocurrent of the a-Si:H TFT, it is possible to consider the effect of the backlight unit system on the photo characteristics of the TFT-LCD(liquid crystal display) panel.
机译:制造具有a-Si:H层的突起的倒置交错型氢化非晶硅薄膜晶体管(a-Si:H TFT),并获得其光电流用于各种背光源,例如冷阴极荧光灯灯(CCFL)和RGB发光二极管(LED)。尽管背光源具有相似的亮度,但是获得了不同的光电流,并且根据背光源的光谱特性而不是亮度来分析结果。结果表明,光电流与在a-Si:H层中产生的电子-空穴对有关,并且该产生取决于背光源光谱特性中峰值强度的波长,因为入射光的吸收是主要在小于500__600 nm的波长下进行。从背光源与a-Si:H TFT的光电流之间的关系,可以考虑背光单元系统对TFT-LCD(液晶显示器)面板的光特性的影响。

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