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Investigation of root 7 x root 3 structures grown on In/Si(111) surfaces at room temperature

机译:室温下在In / Si(111)表面生长的根7 x根3结构的研究

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In/Si(111) superstructures formed by the deposition of indium on a ae3 x ae3-In surface at room temperature were investigated by using a scanning tunneling microscope (STM). The 2x2, 'striped', hexagonal ae7 x ae3 (ae7 x ae3-hex), and rectangular ae7 x ae3 (ae7 x ae3-rec) structures were identified. We demonstrated that the 'striped' and the ae7 x ae3-hex structures were falsely identified as ae7 x ae3-hex and ae7 x ae3-rec in a previous report [A. A. Saranin et al., Phys. Rev. B 74, 035436 (2006)]. As in the ae7 x ae3-hex and ae7 x ae3-rec structures, a ae7 x ae3 periodicity was observed in the resolved STM features of the 'striped' structure. These three ae7 x ae3 structures formed at room temperature were shown to be identical to the corresponding In-induced phases formed at high temperature. The apparent height difference between the 'striped' and the ae7 x ae3-hex structures in the topographic STM image suggests that the ae7 x ae3-hex structure consists of double laeayers of In. This possibility contrasts with recent theoretical predictions of single-layer In for the ae7 x ae3-hex structure.
机译:通过使用扫描隧道显微镜(STM)研究了室温下铟在ae3 x ae3-In表面上沉积时形成的In / Si(111)超结构。确定了2x2,“条纹”,六边形ae7 x ae3(ae7 x ae3-hex)和矩形ae7 x ae3(ae7 x ae3-rec)结构。我们证明“条纹”结构和ae7 x ae3-hex结构在以前的报告中被错误地标识为ae7 x ae3-hex和ae7 x ae3-rec。 A. Saranin等,物理学。 B 74,035436(2006)。像在ae7 x ae3-hex和ae7 x ae3-rec结构中一样,在“条状”结构的已解析STM特征中观察到ae7 x ae3周期性。显示在室温下形成的这三个ae7 x ae3结构与在高温下形成的相应的In诱导相相同。地形STM图像中'striped'与ae7 x ae3-hex结构之间的明显高度差表明ae7 x ae3-hex结构由In的双层组成。这种可能性与最近关于ae7 x ae3-hex结构的单层In的理论预测相反。

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